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Lightwind L3 for Downstream Process Analysis  

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Trace of TiN chamber clean with endpoint followed by cycled
​seasoning
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Trace of ALD Process showing changes in precursor flow


The Lightwind L3 is designed to monitor gas phase processes downstream of  a vacuum chamber.  An inductively coupled plasma source ionizes process effluent so that its emission spectrum can be analyzed.  Designed to operate continuously the ionization source is built of materials that are resistant to halogens such as Fluorine and Chlorine.   In many applications the ICP is maintenance free, or requires a simple optical window change out (taking less the 5 minutes).   The L3  can be used to monitor processes that are otherwise "dark" such as CVD or ALD.   Emission sensitivity varies based on the process reaction rate but can reliably detect contact etch endpoint with < 2 % exposed surface area. 
Applications for the L3:
  • Chamber Clean endpoint
  • Preprocess wafer clamp failure
  • Process endpoint
  • Leak detection
  • ALD precursor flow errors  
    •  allowing reliable reduced precursor flow
    • system ROI based on precursor savings
  • Continuous Process SPC
There are three configurations of the L3 based on their use.  
The  
oem.1 is designed to be embedded with a host tool and to communicate spectral information and control for process endpoint, chamber clean endpoint.
 The oem.2 is the same as the oem.1 with an application specific spectrometer supplied.
The L3 is a complete spectroscopy solution designed for process diagnostics, and includes:
  • a broad range spectrometer   (200 to 850 nm)
  • icp and RF supply
  • laptop
  • software for data     collection and visualization

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More Information

L3 oem.1

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More Information

L3 oem.2

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More Information

L3 Complete System


ALD: Monitoring Process Gass

ald_effluent_monitoring__.pdf
File Size: 65 kb
File Type: pdf
Download File

ALD: Improving Reliability
​and Process Uptime

​
improving_ald_uptime.pdf
File Size: 788 kb
File Type: pdf
Download File

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CONTACT US
  • L I G H T W I N D
  • SOLUTIONS
    • Semiconductor >
      • Thin Film Measurement
      • Plasma and CVD Gas Analysis >
        • L Series: Downstream Process Spectroscopy
        • S Series: Window Mount
      • Plasma and Wet Etch Process Endpoint >
        • Wet Etch Endpoint
    • Materials Analysis >
      • Reflectance
    • Chemical Analysis >
      • Gas Measurement
      • Absorption Spectroscopy
      • Fluorescence Spectroscopy
      • Raman >
        • Raman Products >
          • Portable Raman
          • PreConfigured Raman Systems
          • Automated Raman Systems
          • Raman Software
    • MultiSpectral Imaging >
      • Multispectral Example
      • Multispectral Imaging Resources
    • Education
    • Solar
    • BioScience
    • Food Science >
      • Food Science Resources
      • Comparison Of F Series Analyzers
    • Plasma Spectroscopy >
      • Plasma Spectroscopy Kits
      • Plasma Spectroscopy Systems
  • PRODUCTS
    • Spectrometers, Detectors, Fiber Optics
    • Fiber Optic Cables
    • Flow Cells
    • Lasers
    • Software >
      • Analyze IQ
      • Ocean Optics Software
  • SERVICES
    • OEM Components
    • Custom Engineering
  • RESOURCES
    • Lightwind Software Instructional Videos >
      • Configuring and Viewing Data
      • Template and Recipe Operations
      • Endpoint
  • CONTACT
    • ABOUT US
  • Category
  • Solara