L Series Exhaust Plasma Monitoring Systems

Lightwind L3 for Downstream Process Analysis

Trace of TiN chamber clean with endpoint followed by cycled
seasoning

Trace of ALD Process showing changes in precursor flow

The Lightwind L3 is designed to monitor gas phase processes downstream of a vacuum chamber. An inductively coupled plasma source ionizes process effluent so that its emission spectrum can be analyzed. Designed to operate continuously the ionization source is built of materials that are resistant to halogens such as Fluorine and Chlorine. In many applications the ICP is maintenance free, or requires a simple optical window change out (taking less the 5 minutes). The L3 can be used to monitor processes that are otherwise "dark" such as CVD or ALD. Emission sensitivity varies based on the process reaction rate but can reliably detect contact etch endpoint with < 2 % exposed surface area.

Applications for the L3:

Chamber Clean endpoint
Preprocess wafer clamp failure
Process endpoint
Leak detection
ALD precursor flow errors
- allowing reliable reduced precursor flow
- system ROI based on precursor savings
Continuous Process SPC

There are three configurations of the L3 based on their use. The first, the oem.1 is designed to be embedded with the host tool responsible for both spectral acquisition and control of the rf source. The rf supply is controlled remotely. The oem.2 has an rf supply that is both manually and remotely controlled. The system, although designed for oem use can be supplied with Lightwind software. The standard L3 is a complete spectroscopy solution including: