Lightwind    started in 2001 with the introduction of  its  first product, the L3,  designed to provide critical chemical information about vacuum based semiconductor processes.  The L3 uses a plasma source to ionize process gases coupled with spectroscopy to identify and monitor them. One  process critical application is Atomic Layer Deposition where  incomplete deposition of three or four  Angstroms may mean  device failure.  Designed to operate with a continuous plasma  the L3 has accumulated more than 400,000 mfg hours in ALD alone.
Our  second semiconductor spectroscopy solution was the   

S2. The S2 analyzes light given off during actual  process;   it was created as a cost effective capability  upgrade for most plasma etch systems in production.
Through developing our technology and applications Lightwind has been awarded multiple patents in the United States as well as  throughout the world.
July 2009 Lightwind became a distributor for Ocean Optics products on the  West Coast.  With that relationship Lightwind has been able to apply its automation and control expertise in other important areas  where spectroscopy can be used to provide   solutions which incorporate monitoring, detection, measurement or control of manufacturing processes. 
​
Lightwind has since added additional products that extend the range of capabilities  and solutions that we can offer

• Infrared  
• Far Infrared                        
• Education                                     
• Semiconductor                              
• LED Test an Manufacturing                                    
• Solar Cell Test and Manufacturing                                     
• Gas Analysis  
• Raman
• Automated Raman Measurements                            

---