Semiconductor Solutions:  Process Monitoring

Plasma and Gas Analysis

Lightwind offers both exhaust analysis as well as thru the window spectroscopy solutions for continuous process monitoring.  Thru the window monitoring can track gas flows, rf errors or anything that can degrade process control.  Exhaust monitoring on "dark" processes can offer a measurement of  otherwise invisible processes. For example, precursor flow during ALD can be tracked for variations that cause device failure. 

Endpoint for Plasmas, CVD Systems,and Wet Etch Systems

LIghtwind offers endpoint solutions for many processes, including vacuum based (plasma) processes, cvd clean endpoint  where there is no process plasma, or wet etch endpoint.   

Thin Film Measurement
Thin film measurement is a critical process parameter to measure.  Table top or inline systems are available for most films and polymers in semiconductor as well a printed circuit board manufacture.

Laser Induced Breakdown Spectroscopy
Laser induced breakdown spectroscopy is a powerful tool for materials analysis. It requires little or no sample preparation and is virtually nondestructive. LIBS provides very rapid sample measurement  with sampling times measured in milliseconds.

Raman Spectroscopy

Raman spectroscopy uses a laser to stimulate emission spectra of liquids and solids.  It is virtually non destructive and provides a quick spectral signature, without sample preparation, in most cases

Education
Education resources include spectrometers designed for the the chemistry or physics classroom as well as training kits that have both the required  spectroscopy hardware and  lesson plans.

OEM and Custom Solutions
While Lightwind has preconfigured  OEM products, we also offer systems that can be adapted to  OEM or manufacturing environments. Additionally, many  spectroscopy components can be adapted or embedded for specialized
manufacturing applications.