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  • Lightwind Wet Etch Endpoint Aep 2

Lightwind Wet Etch Endpoint Aep 2

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The Lightwind Aep 2 is an add-on endpoint system for wet processing. Utilizing optical reflectance spectroscopy, automated endpoint detection is now an option for many wet processing applications.

​The Aep 2 is specifically designed to improve wet etch process control, while offering a measurement that adjusts to concentration changes in the bath. With time resolution of 1 second for endpoint, normal process variation and undercut are reduced and become more reproducible. Etch for many different films can be controlled by endpoint (such as Ti/oxide, Cu/Ti) .

Benefits of endpoint control

Improved Process Control

  •  1 second resolution on measured wafer
  •  endpoint is based on wafer clearing, so it automatically adjusts

       to changes in bath concentrations and temperature

  •  undercut associated with overetch is reduced
  •  endpoint allows more tolerance to batch chemistry variations

Cost savings

  •  automated endpoint minimizes process time associated with

       fixed time processes, allowing higher throughput

  •  increased throughput, or simply reduced process time reduces

       chemical costs and disposal costs

  •  reduction in number of test wafers required

Non Invasive

  •  endpoint hardware can be mounted outside the bath or process    

       enclosure in most cases


​System Specification

Sensor Head Typically very small, configured to be tool specific

             Consists of a light source and light detector

Light source  Vis -NIR Optimized for films of interest

             Lifetime Projected 10,000 hours or 1/ year

             

Spectrometer Vis / NIR Multichannel multiple

             active wavelengths  Resolution ~ 2 microns

             Sample rate: variable depends on light but can be

             as little as 10 milliseconds

Software     Lightwind endpoint and data logging software

             includes endpoint simulator, strip chart recording

             data logging for selected channels or full spectra. 

             Output for ethernet/factory link.

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CONTACT US
  • L I G H T W I N D
  • SOLUTIONS
    • Semiconductor >
      • Plasma and CVD Gas Analysis >
        • L Series: Downstream Process Spectroscopy
        • S Series: Window Mount
      • Plasma and Wet Etch Process Endpoint >
        • Wet Etch Endpoint
    • Plasma Spectroscopy >
      • Plasma Spectroscopy Systems
    • Materials Analysis
    • Raman
    • Multispectral Imaging Resources
    • Solar
    • Fluorescence Imaging
    • Raman Spectroscopy and Microscopy
  • PRODUCTS
    • Flow Cells
    • Software >
      • Analyze IQ
  • SERVICES
    • Custom Engineering >
      • Laser Induced Breakdown Spectroscopy
  • RESOURCES
    • Lightwind Software Instructional Videos >
      • Configuring and Viewing Data
      • Template and Recipe Operations
      • Endpoint
  • CONTACT
    • ABOUT US