Lightwind L3 Downstream Plasma/Gas Analysis

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The  L  Series of  vacuum spectroscopy systems incorporate a plasma source which ionizes gas to give off light, and a spectrometer. Because this series includes an ionization source this is ideal for chemical processes where there is no light. In addition, the plasma sources are designed for continuous operation in harsh chemical environments making them ideal for process characterization, monitoring, endpoint.  This series is also very useful for  process troubleshooting, chamber matching,  chamber clean characterization on CVD systems, etch endpoint, cleaning processes, deposition...including ALD .  The L3 has over 500,000  hours in ALD manufacturing.
Included are:
  • ICP   (inductively coupled plasma source)  Internal surface are not affected by long term exposure to halogens
  • Software: Lightwind Process Monitoring and Endpoint control software
  • RF supply   no panel, designed for remote operation   13. 56 mhz   100 watts
  • Cabling    (RF, Fiber Optic)
  • PC
  • Digital I/O with rf power controlled by Lightwind recipe
  • Spectrometer     
    • Range 200 to 850 nm
    • 25 micron slit
    • 1.3 nm resolution 
    • 2048 pixels
  • Options
    • ​Application specific spectrometers