Lightwind L3 Optical Residual Gas Analyzer

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The Lightwind L3 systems is comprised of an inductively coupled plasma source, power supply, spectrometer and Lightwind software. The system is designed to operate in corrosive environments such as fluorine or chlorine rich environment The operation pressure range without differential pumping is from 10 -2 to 3 Torr

In addition, the plasma sources are designed for continuous operation in harsh chemical environments making them ideal for process characterization, monitoring, endpoint. This series is also very useful for process troubleshooting, chamber matching, chamber clean characterization on CVD systems, etch endpoint, cleaning processes, deposition...including ALD . The L3 has over 500,000 hours in ALD manufacturing.

Included are:

  • ICP (inductively coupled plasma source) Internal surface are not affected by long term exposure to halogens
  • Software: Lightwind Process Monitoring and Endpoint control software
  • RF supply no panel, designed for remote operation 13. 56 mhz 100 watts
  • Cabling  (RF, Fiber Optic)
  • PC
  • Digital I/O with rf power controlled by Lightwind recipe
  • Spectrometer   
  • Range 200 to 850 nm
  • 25 micron slit
  • 1.3 nm resolution 
  • 2048 pixels
  • Options
  • ​Application specific spectrometers