Semiconductor Solutions:  Process Monitoring

Plasma and Gas Analysis

Lightwind offers both exhaust analysis as well as thru the window spectroscopy solutions for continuous process monitoring.  Thru the window monitoring can track gas flows, rf errors or anything that can degrade process control.  Exhaust monitoring on "dark" processes can offer a measurement of  otherwise invisible processes. For example, precursor flow during ALD can be tracked for variations that cause device failure. 

Endpoint for Plasmas, CVD Systems,and Wet Etch Systems

LIghtwind offers endpoint solutions for many processes, including vacuum based (plasma) processes, cvd clean endpoint  where there is no process plasma, or wet etch endpoint.   

OEM and Custom Solutions
While Lightwind has preconfigured  OEM products, we also offer systems that can be adapted to  OEM or manufacturing environments. Additionally, many  spectroscopy components can be adapted or embedded for specialized
manufacturing applications.