Lightwind L Series for Downstream Process Analysis  

Trace of TiN chamber clean with endpoint followed by cycled
​seasoning

Trace of ALD Process showing changes in precursor flow
The Lightwind L3 Series is designed to monitor gas phase processes downstream of  a vacuum chamber.  An inductively coupled plasma source ionizes process effluent so that its emission spectrum can be analyzed.  Designed to operate continuously the ionization source is built of materials that are resistant to halogens such as Fluorine and Chlorine.   In many applications the ICP is maintenance free, or requires a simple optical window change out (taking less the 5 minutes).   The L3  can be used to monitor processes that are otherwise "dark" such as CVD or ALD.   Emission sensitivity varies based on the process reaction rate but can reliably detect contact etch endpoint with < 2 % exposed surface area. 
Applications for the L3:
  • Chamber Clean endpoint
  • Preprocess wafer clamp failure
  • Process endpoint
  • Leak detection
  • ALD precursor flow errors  
    •  allowing reliable reduced precursor flow
    • system ROI based on precursor savings
  • Continuous Process SPC
There are three configurations of the L3 based on their use.  
The  oem.1 is designed to be embedded with a host tool and to communicate spectral information and control for process endpoint, chamber clean endpoint.
 The oem.2 is the same as the oem.1 with an application specific spectrometer supplied.
The L3 is a complete spectroscopy solution designed for process diagnostics, and includes:
  • a broad range spectrometer   (200 to 850 nm)
  • icp and RF supply
  • laptop
  • software for data     collection and visualization
         Lx  RGA  for pressures from   10-8 to 10-2 Torr
L3 RGA for pressures from 10-3 to 3 Torr
ALD: Monitoring Process Gass
ald_effluent_monitoring__.pdf
File Size: 65 kb
File Type: pdf
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ALD: Improving Reliability
​and Process Uptime
​
improving_ald_uptime.pdf
File Size: 788 kb
File Type: pdf
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