Lightwind    started in 2001 with the introduction of  its  first product, the L3,  designed to provide critical chemical information about vacuum based semiconductor processes.  The L3 uses a plasma source to ionize process gases coupled with spectroscopy to identify and monitor them. One  process critical application is Atomic Layer Deposition where  incomplete deposition of three or four  Angstroms may mean  device failure.  Designed to operate with a continuous plasma  the L3 has accumulated more than 400,000 mfg hours in ALD alone.
Through developing our technology and applications Lightwind has been awarded multiple patents in the United States as well as  throughout the world.
Our  second semiconductor spectroscopy solution was the   

 S2 designed for window access to existing plasma processes. This allows adding endpoint capability or even upgrading sensitivity for existing processes. 
The Lx was introduced in 2026 as a compliment to the L3.   The Lx replaces  standard RGA's -which use ion fragmentation- with an 
optical emission spectrometer.. Since it does not use a filament the reliability is significantly improved while adding  much better chemical  resistance in many  gas environments.   The L3 operates at pressures from 3 Torr down to 10-3 Torr. The Lx extends the optical RGA range down to 10-7 matching the  lower pressures of many traditional RGA's while also reaching pressures where those RGAs would require differential pumping. 

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