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         L I G H T W I N D

                                                     Look Closer
​

                          We work  with light to provide real time chemistry
                           insight for monitoring, control , endpoint, leak  
                           detection, and analysis of  vacuum processes
                           such as  CVD, ALD, Etch and Sputtering. 
                          The new Lx extends gas analysis to 10-8 Torr
                           and can, using optical emission spectroscopy,  
                           replace traditional  Residual Gas Analyzers

                 
                        



F I N D  A  P R O D U C T
F I N D  A  S O L U T I O N
L Series Residual Gas Analysers
CONTACT US

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CONTACT US
  • L I G H T W I N D
  • SOLUTIONS
    • Semiconductor >
      • Plasma and Wet Etch Process Endpoint >
        • Wet Etch Endpoint
    • Plasma Spectroscopy >
      • Plasma Spectroscopy Systems
  • PRODUCTS
    • Plasma, CVD, ALD Gas Analysis >
      • L Series Applications
      • L Series: Downstream Process Spectroscopy
      • Lx Residual Gas Analyzer
      • S Series: Window Mount
    • Flow Cells
    • Software
  • RESOURCES
    • Lightwind Software Instructional Videos >
      • Configuring and Viewing Data
      • Template and Recipe Operations
      • Endpoint
  • SERVICES
    • Custom Engineering
  • CONTACT
    • ABOUT US