Better process control starts with better data

 With Lightwind technology, your tool can tell you far more about what's limiting your yields than you ever thought possible. We give you the insight you need to take preventative action early, long before you have a problem. Our technology is focused on the monitoring of process conditions – not just controlling tool parameters.

 We let you tap into a wealth of data, giving you a complete, real-time picture of the chemical activity that counts. With this knowledge, you can:

• monitor and control chemical processes in-line before, during and after you commit wafers
• isolate inconsistent and faulty process behavior at the molecular level
• eliminate "first-wafer" effects
• measurably improve product yield
• significantly offset metrology investments

The power to know more

Lightwind's patented process monitoring and fault detection/classification technology is based on the real-time sampling of a small volume of gas from the exhaust port of a processing chamber (such as those found on etch, photoresist strip and deposition tools).

To determine the exact state of the process chamber, Lightwind's always-on platform incorporates:

• a low-power inductively coupled plasma chamber. Unlike conventional process monitoring systems, which rely on light generated by plasma during processing, our approach uses its own plasma, which is always "on" and optimized to give you a comprehensive view of the chamber's chemical state.
• powerful software that distills complex process data into simple, actionable information, so you can make smarter decisions faster.
• an unprecedented level of wafer process integration using a tool centric or fab centric approach.

Virtually any manufacturing scenario involving a process gas can be improved with Lightwind technology. That's why, backed by a comprehensive patent portfolio, Lightwind's scientists continue to expand the technology to new applications and solutions for the manufacturing environment.

Lightwind. We're closing the process loop at the wafer.