Semiconductor Products L series and S series

Text Box: The S Series relies on light emitted by chemical processes, typically plasma processes. The several different products in this series offer choices of spectrometer types/hardware configurations and software. Spectrometers typically are scaled for sensitivity from 200 to 850 nm, although they can optionally be upgrade to extended ranges of 200 to 1100 nm . Resolution is typically 1.3 nm, but application specific spectrometer configurations can provide < 1.0 nm upon request. Lightwind software which is included is designed to support continuous monitoring, endpoint, and with tool automation to follow process recipe changes, or output information to the factory or to fault detection software. Options include, chamber window mounts with additional collection lenses, and Lightwind Data Viewer software.

The L Series of vacuum sensors incorporate a plasma source which ionizes gas to give off light, and a spectrometer. Because this series includes an ionization source this it is ideal for chemical processes where there is no light. In addition the plasma sources are designed for continuous operation in harsh chemical environments making them ideal for process characterization, monitoring, endpoint. This series is ideally suited for process troubleshooting and chamber matching as well as chamber clean characterization on CVD systems. This series can be used to endpoint etch processes, cleaning processes, deposition...including ALD . The L3 has been used for over 500,000 hours in ALD manufacturing.

Lightwind software which is included is designed to support continuous monitoring, endpoint, and with tool automation to follow process recipe changes, or output information to the factory or to fault detection software.

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