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Endpoint Sensitivity For Different Exposed Surface Areas |
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Our Technology |
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S E M I C O N D U C T O R Lightwind technology focuses on the most important metrics of process quality: process chemistry as it changes real time. Lightwind has a patented ICP OES sensor which can continuously monitor almost any process gas while in most cases not requiring any maintenance. Gases such as ClF3, or Atomic Layer Deposition precursors can be analyzed continuously. Monitoring the process chemistry is the only way to understand the chemical process the wafer is exposed to and of course the quality of the wafer produced. Software for visualizing and understanding high value OES data is the second major focus for Lightwind technology. Our software is designed to be visual for realtime interaction as well as able to interface with existing factory automation schemes. |
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Leak Detection
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Copyright 2010 Lightwind Corporation |
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OES Spectra: Normal vs Leak |
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Example of OES Spectra |
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About Us |
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Overview |
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Intelligent Sensor and Technology Solutions |